In leading edge devices, inspecting every layer with nano & micro defect inspection system alone is less than optimal. PRESTIGE is able to perform high speed while maintaining sufficient test sensitivity for various applications including lithography, etching and CMP. High speed inspections enable samples to be taken from more Processes, keeping wafer loss to a minimum through the detection of problems in the early stages. Since speedy product launch is directly linked to device manufacturer's profits, the efficient use of both nano & micro inspection systems and PRESTIGE fully optimize the inspection systems.

Concept of Fujikom's inspection system

Ideally, inspection system can clear next action movement. As a result of inspection, it's extremely important that machine can lead to a solution to point out what step is quickly judged. For instance, as a purpose of monitoring for a yield ratio, it's not a real inspecting unless otherwise making an correct judgment for inspection LOT. Our inspection systems such as PRESTIGE, POLESTAR, PASSAGE can detect what causes a difference of defect and process change that affects a yield ratio.

These systems can instantly detects critical yield-lowering defects at each stage from initial development to mass production, and is designed to provide a feedback to the Process. Through the automation of visual inspections, PRESTIGE, POLESTAR, PASSGE have been developed to quantify results and to reduce judgment errors in human eye inspections. Image contrast is enhanced and higher resolutions are achieved by Combining a new optical and image capture technologies and process architectures And false defects are efficiently filtered during inspection

We will continuously design and develop more advanced inspection systems for the benefits for endusers and cost reduction is our primary goal.
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